SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Anthracene-organosiloxane spin-on antireflective coating for KrF lithography
Kennedy, Joseph T., Baldwin-Hendricks, Teri, Hebert, Mello, Suedmeyer, Arlene, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485154
File:
PDF, 588 KB
english, 2003