SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Enhancement of CD uniformity and throughput with KrF photomask repeater
Ha, Tae-Joong, Choi, Yong-Kyoo, Han, Oscar, Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485359
File:
PDF, 351 KB
english, 2003