SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Advances in resist pattern transfer process using 157-nm lithography
Furukawa, Takamitsu, Sturtevant, John L., Hagiwara, Takuya, Kawaguchi, Etsurou, Matsunaga, Kentaro, Suganaga, Toshifumi, Itani, Toshiro, Fujii, KiyoshiVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.535177
File:
PDF, 378 KB
english, 2004