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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Multivariate analysis of a 100-nm process measured by in-line scatterometry
Egret, Sebastien, Silver, Richard M., Furusho, Tetsunari, Baudemprez, BartVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.535455
File:
PDF, 198 KB
english, 2004