SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Realization of sub-80-nm small-space patterning in ArF photolithography
Kim, Si-Hyun, Sturtevant, John L., Kim, Hyung-Do, Lee, Si-Hyeung, Park, Chang-Min, Ryoo, Man-Hyoung, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-TaeVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.536340
File:
PDF, 595 KB
english, 2004