SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - BEOL lithography for early development at the 65-nm node
DellaGuardia, Ronald, Smith, Bruce W., Kwong, Ranee W., Li, Wenjie, Lawson, Peggy, Burkhardt, Martin, Grauer, Ioana C., Wu, Qiang, Angyal, M., Hichri, H., Melville, Ian, Kumar, K., Lin, Y., Holmes, StVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.544238
File:
PDF, 963 KB
english, 2004