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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Nanoscale dimensional focused ion beam repair of quartz defects on 90-nm node alternating aperture phase shift masks
Robinson, Tod E., Tanabe, Hiroyoshi, Graupera, Anthony, Morrison, Troy B., Ramstein, MarcusVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557737
File:
PDF, 600 KB
english, 2004