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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Model-based interpretation filtering for complex two-dimensional layout features
Melvin III, Lawrence S., Tanabe, Hiroyoshi, Shiely, James P., Cork, Christopher M., Rieger, Michael L.Volume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557742
File:
PDF, 99 KB
english, 2004