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SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] MEMS/MOEMS Technologies and Applications II - Two new types of microneedle array fabricated by x-ray lithography
Li, Yigui, Ma, Zhichun, Jin, Guofan, Sugiyama, Susumu, Chen, XuyuanVolume:
5641
Year:
2004
Language:
english
DOI:
10.1117/12.566563
File:
PDF, 615 KB
english, 2004