SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Formation and verification of a 90-nm contact lumped model
Hung, Chi-Yuan, Staud, Wolfgang, Weed, J. Tracy, Zhang, Bin, Wang, Yong DoneVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.569308
File:
PDF, 286 KB
english, 2004