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SPIE Proceedings [SPIE Optics East - Philadelphia, PA (Monday 25 October 2004)] Nanofabrication: Technologies, Devices, and Applications - Self-assembled ultra-low-k porous silica films for 45-nm technology node
Kikkawa, Takamaro, Lai, Warren Y., Pau, Stanley, Oku, Y., Kohmura, K., Lopez, O. Daniel, Fujii, N., Tanaka, H., Ishikawa, A., Matsuo, H., Sonoda, Y., Miyoshi, H., Goto, T., Hata, N., Seino, Y., TakadaVolume:
5592
Year:
2004
Language:
english
DOI:
10.1117/12.571092
File:
PDF, 400 KB
english, 2004