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SPIE Proceedings [SPIE SPIE Proceedings - (Sunday 12 February 2012)] - Interferometric lithography at 46.9 nm
Capeluto, M. G., Vaschenko, Georgiy O., Grisham, Michael E., Marconi, Mario C., Menoni, Carmen S., Rocca, Jorge J., Luduena, S., Pietrasanta, L., Marcano O., Aristides, Paz, Jose LuisYear:
2012
Language:
english
DOI:
10.1117/12.592201
File:
PDF, 305 KB
english, 2012