SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Comparison of etching tools for resist pattern transfer
Horn, Mark W., Hartney, Mark A., Kunz, Roderick R., Novembre, Anthony E.Volume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59764
File:
PDF, 577 KB
english, 1992