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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - High-resolution residual layer thickness metrology using x-ray reflectivity
Lee, Hae-Jeong, Mackay, R. Scott, Soles, Christopher L., Ro, Hyun W., Hines, Daniel R., Jones, Ronald L., Lin, Eric K., Wu, Wen-liVolume:
5751
Year:
2005
Language:
english
DOI:
10.1117/12.600004
File:
PDF, 274 KB
english, 2005