SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography
Zhang, Peng, Sturtevant, John L., Rao, Madhukar B., Jaramillo, Jr., Manuel, Horvath, Bridget, Ross, Brenda, Paxton, Ted, Davis, Todd, Cook, Pat, Witko, DavidVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.600066
File:
PDF, 837 KB
english, 2005