![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Design-based metrology: advanced automation for CD-SEM recipe generation
Tabery, C., Silver, Richard M., Capodieci, L., Haidinyak, C., Shah, K., Threefoot, M., Choo, B., Singh, B., Nehmadi, Y., Ofek, C., Menadeva, O., Ben-Porath, A.Volume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.601143
File:
PDF, 637 KB
english, 2005