SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Study of barrier coats for application in immersion 193-nm lithography
Houlihan, Francis, Sturtevant, John L., Kim, Wookyu, Sakamuri, Raj, Hamilton, Keino, Dimerli, Alla, Abdallah, David, Romano, Andrew, Dammel, Ralph R., Pawlowski, Georg, Raub, Alex, Brueck, SteveVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.601768
File:
PDF, 1.26 MB
english, 2005