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SPIE Proceedings [SPIE Optical Metrology - Munich, Germany (Monday 13 June 2005)] Nano- and Micro-Metrology - Investigation and evaluation of scatterometric CD metrology methods
Wurm, Matthias, Ottevaere, Heidi, DeWolf, Peter, Bodermann, Bernd, Mirande, Werner, Wiersma, Diederik S.Volume:
5858
Year:
2005
Language:
english
DOI:
10.1117/12.612610
File:
PDF, 346 KB
english, 2005