SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Evaluation of transparent etch stop layer phase shift mask patterning and comparison with the single trench undercut approach
Rody, Y., Weed, J. Tracy, Martin, Patrick M., Martin, P., Couderc, C., Sixt, P., Gardin, C., Lucas, K., Patterson, K., Miramond-Collet, C., Belledent, J., Boone, R., Borjon, A., Trouiller, Y.Volume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632561
File:
PDF, 306 KB
english, 2005