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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Spin-on hard mask with dual-BARC property for 50-nm devices
Hah, Jung Hwan, Lin, Qinghuang, Chae, Yun Sook, Jang, Yun-Kyeong, Ryoo, Manhyoung, Choi, Sang-Jun, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-TaeVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.656075
File:
PDF, 741 KB
english, 2006