SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Scatterfield microscopy using back focal plane imaging with an engineered illumination field
Patrick, Heather J., Archie, Chas N., Attota, Ravikiran, Barnes, Bryan M., Germer, Thomas A., Stocker, Michael T., Silver, Richard M., Bishop, Michael R.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656452
File:
PDF, 307 KB
english, 2006