SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - The role of stress in nanoimprint lithography
Ro, Hyun W., Lercel, Michael J., Ding, Yifu, Lee, Hae-Jeong, Hines, Daniel R., Jones, Ronald L., Lin, Eric K., Karim, Alamgir, Wu, Wen-li, Soles, Christopher L.Volume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.656742
File:
PDF, 142 KB
english, 2006