SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Across field CD control improvement for critical level imaging: new applications for layout correction and optimization
Zach, Franz, Wong, Alfred K. K., Singh, Vivek K., Percin, Gökhan, Sezginer, ApoVolume:
6156
Year:
2006
Language:
english
DOI:
10.1117/12.657268
File:
PDF, 274 KB
english, 2006