SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Defect inspection for imprint lithography using a die-to-database electron beam verification system
Myron, L. Jeff, Lercel, Michael J., Thompson, Ecron, McMackin, Ian, Resnick, Douglas J., Kitamura, Tadashi, Hasebe, Toshiaki, Nakazawa, Shinichi, Tokumoto, Toshifumi, Ainley, Eric, Nordquist, Kevin, DVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.659457
File:
PDF, 977 KB
english, 2006