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SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - A new critical dimension metrology for chrome-on-glass substrates based on s-parameter measurements extracted from coplanar waveguide test structures
Nwokoye, Chidubem A., Martin, Patrick M., Naber, Robert J., Zaghloul, Mona, Cresswell, Michael W., Allen, Richard A., Murabito, Christine E.Volume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.686706
File:
PDF, 175 KB
english, 2006