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SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Inspectability and printability of lines and spaces halftone masks for the advanced DRAM node
Dürr, Arndt C., Martin, Patrick M., Naber, Robert J., Gutjahr, Karsten, Heumann, Jan, Stengl, Martin, Katzwinkel, Frank, Frangen, Andreas, Witte, ThomasVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.693061
File:
PDF, 264 KB
english, 2006