SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Novel technology of automatic macro inspection for 32-nm node and best focus detection
Fukazawa, Kazuhiko, Archie, Chas N., Endo, Kazumasa, Yoshino, Kiminori, Yamazaki, YuichiroVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.711410
File:
PDF, 751 KB
english, 2007