SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Adapting immersion exposure to mass production by adopting a cluster of novel resist-coating/developing and immersion-exposure equipment
Fujiwara, Tomoharu, Lin, Qinghuang, Ishikawa, Jun, Kawakubo, Tadamasa, Ishii, Yuuki, Kyoda, Hideharu, Wakamizu, Shinya, Shimoaoki, TakeshiVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711853
File:
PDF, 580 KB
english, 2007