SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Application of full-chip optical proximity correction for sub-60-nm memory device in polarized illumination
Yune, Hyoung-Soon, Flagello, Donis G., Ahn, Yeong-Bae, Lee, Dong-jin, Moon, James, Nam, Byung-Ho, Yim, Dong-gyuVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711977
File:
PDF, 513 KB
english, 2007