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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Nanoimprint lithography for the direct patterning of nanoporous interlayer dielectric insulator materials
Ro, Hyun Wook, Lercel, Michael J., Lee, Hae-Jeong, Lin, Eric K., Karim, Alamgir, Hines, Daniel R., Yoon, Do Y., Soles, Christopher L.Volume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.712347
File:
PDF, 1.32 MB
english, 2007