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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Fundamental study on the error factor for sub 90nm OPC modeling
Lee, Hyesung, Naber, Robert J., Kawahira, Hiroichi, Lee, Sang-Uk, Kim, Jeahee, Kim, KeehoVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746821
File:
PDF, 251 KB
english, 2007