SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Improvement of gate CD uniformity for 55 nm node logic devices
Murakami, Takashi, Allgair, John A., Raymond, Christopher J., Nakata, Taisaku, Taniguchi, Kensuke, Uchiyama, Takayuki, Jyousaka, Megumi, Tadokoro, Masahide, Konishi, YoshitakaVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.771548
File:
PDF, 390 KB
english, 2008