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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Assist feature aware double patterning decomposition
Cork, Christopher, Kawahira, Hiroichi, Zurbrick, Larry S., Barnes, Levi, Luk-Pat, GerardVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801562
File:
PDF, 8.29 MB
english, 2008