SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Spacer double patterning technique for sub-40nm DRAM manufacturing process development
Shiu, Weicheng, Chen, Alek C., Lin, Burn, Ma, William, Lee, Hong Wen, Yen, Anthony, Wu, Jan Shiun, Tseng, Yi Min, Tsai, Kevin, Liao, Chun Te, Wang, Aaron, Yau, Alan, Lin, Yi Ren, Chen, Yu Lung, Wang,Volume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.804641
File:
PDF, 1.08 MB
english, 2008
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