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SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Novel process proximity correction by the pattern-to-pattern matching method with DBM
Park, Dae-Jin, Chen, Alek C., Lin, Burn, Choi, Jinyoung, Yune, Hyoungsoon, Yen, Anthony, Choi, Jaeseung, Kim, Cheolkyun, Choi, Bong-Ryoul, Yim, DonggyuVolume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.804660
File:
PDF, 470 KB
english, 2008