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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Optical performance of laser light source for ArF immersion double patterning lithography tool
Wakana, Katsuhiko, Levinson, Harry J., Dusa, Mircea V., Tsushima, Hiroaki, Matsumoto, Shinichi, Yoshino, Masaya, Kumazaki, Takahito, Watanabe, Hidenori, Ohta, Takeshi, Tanaka, Satoshi, Suzuki, Toru, NVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.813476
File:
PDF, 244 KB
english, 2009