SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Abbe-PCA (Abbe-Hopkins): microlithography aerial image analytical compact kernel generation based on principle component analysis
Tsai, Meng-Fong, Levinson, Harry J., Dusa, Mircea V., Chang, Shi-Jei, Chen, Charlie Chung Ping, Melvin III, Lawerence S.Volume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814419
File:
PDF, 1.06 MB
english, 2009