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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Reworkable spin-on trilayer materials: optimization of rework process and solutions for manufacturability
Zhang, Ruzhi, Henderson, Clifford L., Timko, Allen G., Zook, John, Wei, Yayi, Pylneva, Lyudmila, Yi, Yi, Li, Chenghong, Wu, Hengpeng, Rahman, Dalil, McKenzie, Douglas S., Anyadiegwu, Clement, Lu, PingVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814708
File:
PDF, 783 KB
english, 2009