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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Photomask metrology using a 193nm scatterfield microscope
Quintanilha, R., Zurbrick, Larry S., Montgomery, M. Warren, Barnes, B. M., Sohn, Y., Howard, L. P., Silver, R. M., Potzick, J. E., Stocker, M. T.Volume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.829693
File:
PDF, 1.82 MB
english, 2009