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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Investigation of buried EUV mask defect printability using actinic inspection and fast simulation
Clifford, Chris H., Zurbrick, Larry S., Montgomery, M. Warren, Chan, Tina T., Neureuther, Andrew R., Goldberg, Kenneth A., Mochi, Iacopo, Liang, TedVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.829716
File:
PDF, 729 KB
english, 2009