SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Physical resist models and their calibration: their readiness for accurate EUV lithography simulation
La Fontaine, Bruno M., Klostermann, U. K., Mülders, T., Schmöller, T., Lorusso, G. F., Hendrickx, E.Volume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846549
File:
PDF, 1.30 MB
english, 2010