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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - 45nm-generation parameter-specific ring oscillator monitors
Wang, Lynn T.-N., Rieger, Michael L., Thiele, Joerg, Xu, Nuo, Liu, Tsu-Jae King, Neureuther, Andrew R.Volume:
7641
Year:
2010
Language:
english
DOI:
10.1117/12.846719
File:
PDF, 1.31 MB
english, 2010