SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - Realizing a 45-nm system on chip in the age of variability

Le Cam, Laurent, Rieger, Michael L., Thiele, Joerg, Appleby, Andy, Hurat, Philippe, Carpentier, Benoit, Chen, Kuang-Han, Verghese, Nishath
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Volume:
7641
Year:
2010
Language:
english
DOI:
10.1117/12.848023
File:
PDF, 760 KB
english, 2010
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