SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Native pattern defect inspection of EUV mask using advanced electron beam inspection system
Shimomura, Takeya, Montgomery, M. Warren, Maurer, Wilhelm, Inazuki, Yuichi, Abe, Tsukasa, Takikawa, Tadahiko, Mohri, Hiroshi, Hayashi, Naoya, Wang, Fei, Ma, Long, Zhao, Yan, Kuan, Chiyan, Xiao, Hong,Volume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.868171
File:
PDF, 1.68 MB
english, 2010