SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Study of post-develop defect on typical EUV resist
Harumoto, Masahiko, La Fontaine, Bruno M., Naulleau, Patrick P., Suyama, Sadayasu, Miyagi, Tadashi, Morita, Akihiko, Asai, Masaya, Kaneyama, Koji, Itani, ToshiroVolume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.878859
File:
PDF, 4.26 MB
english, 2011