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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Nanopatterning of diblock copolymer directed self-assembly lithography with wet development
Muramatsu, Makoto, Herr, Daniel J. C., Iwashita, Mitsuaki, Kitano, Takahiro, Toshima, Takayuki, Seino, Yuriko, Kawamura, Daisuke, Kanno, Masahiro, Kobayashi, Katsutoshi, Azuma, TsukasaVolume:
7970
Year:
2011
Language:
english
DOI:
10.1117/12.878931
File:
PDF, 376 KB
english, 2011