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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Gray-level 3D resist process and its application
Ting, Yung-Chiang, Shy, Shyi-Long, Liu, Andy, Wu, Cheng-San, Chen, C. C., Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.915702
File:
PDF, 3.58 MB
english, 2012