SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography
Agudelo, Viviana, Evanschitzky, Peter, Erdmann, Andreas, Fühner, Tim, Conley, WillVolume:
8326
Year:
2012
Language:
english
DOI:
10.1117/12.916344
File:
PDF, 791 KB
english, 2012