SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Feasibility study of character projection-based electron-beam direct writing for logic LSI wiring including automatically routed area with 14nm node technology case
Sugatani, Shinji, Maruyama, Takashi, Kojima, Yoshinori, Takahashi, Yasushi, Takakuwa, Masaki, Ohshio, Shuzo, Ito, Masaru, Tong, William M.Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.916358
File:
PDF, 2.38 MB
english, 2012