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SPIE Proceedings [SPIE 28th European Mask and Lithography Conference (EMLC 2012) - Dresden, Germany (Tuesday 17 January 2012)] 28th European Mask and Lithography Conference - Investigation and mitigation of field-edge CDU fingerprint for ArFi lithography for 45-nm to sub-28-nm logic nodes
Le-Gratiet, Bertrand, Finders, Jo, Mouraille, Orion, Queens, Rene, Escalante, Maryana, Smeets, Bart, Beltman, Jan, Jullian, Karine, Behringer, Uwe F.W., Maurer, WilhelmVolume:
8352
Year:
2012
Language:
english
DOI:
10.1117/12.918535
File:
PDF, 1.85 MB
english, 2012